超精密应力测量仪
Birefringence Measurement system
Signifl cant Features
● Unprecedented sensitivity in low-levelbirefringence measurement
● Simultaneous measurement of birefringencemagnitude and angle
● Precision repeatability
● High-speed measurement
● No moving parts in the optical system
● Automatic mapping of variable-sized opticalelements
● Photoelastic modulator technology
● Simple, user-friendly operation
Birefringence Measurement svstem is versatile enouah to excel in bothproduction floor and RD lab environments. This model is widely used inresearch and industry to measure components: such as Photomask blanksand lithoaraphv reticules. DVD blanks plastic films lens blanks lasercrystals, cell phone display windows, injection molded parts, and manyothers.The bench top desian and intuitive automated scanning softwarmake this product the best choice for dav-in-day-out evaluation of bothHigh Value precision optical components
| SPECIFICATIONS | |||||||
| Retardation Range, nm |
HIGH SensITIVITY ¼Wave Systems 0.005 to 100+ |
EXtENDED RaNGe ½Wave System 0.005 to 300+ |
SPecTRoScOPIc ATS Systems 0.005 to 300+(Red) 0.005 to 250+ (Green) 0.005 to 200+ (Blue) |
||||
|
Resolution / Repeatability Retardation,nm Fast Axis Angle |
0.001/土0.008 0.01°/+0.05° |
0.001/+0.015 0.01°/+0.07° |
0.001/士0.025 0.01°/+0.07° |
||||
| Measurement Rate/Time |
|
Up to 10 pps / Sample Depentenps |
|||||
| Spot Size | Variable, 1-3 mm | ||||||
|
Specifi cations presented are based on 633nm laser source unless otherwise noted. Custom wavelengths are available fromDUV(>150nm) to NIR (<1550nm). Tpical system wavelenaths available are 157nm,193nm, 248nm, 355nm, 405nm, 436nm455nm,470nm,505nm,530nm, 546m, 617nm, 625nm, 632.8nm, 660nm, 850nm,1064nm, 1310nm and 1550nm
|
|||||||
